工学部・大学院工学研究科トップ > 教員一覧 > 岡 好浩

大学院工学研究科/教員一覧

氏名 岡 好浩
フリガナ オカ ヨシヒロ
所属 大学院 電気系工学専攻 / 物性・デバイス工学部門
学部 電子情報電気工学科 / 電子素子・回路コース
研究グループ 電子物理研究グループ
連絡 TEL 079-267-4868
FAX 079-267-4868
役職 准教授
学位 博士(工学)
顔写真

担当
科目
大学院 計測工学講究I 、電子物理セミナ−I 、蓄電デバイス工学、電気系工学特別実験BI、電気系工学特別実験BII
学部 電気系数学、電気回路演習、電気系実験A、電気系実験B、卒業研究
専門分野 リチウムイオン電池一般、プラズマ工学
研究内容 全固体薄膜リチウムイオン二次電池に関する研究
リチウムイオン二次電池正極の特性改善に関する研究
リチウムイオン二次電池の正極用水系塗料に関する研究
全固体リチウムイオン二次電池に関する研究
液中プラズマを用いた疎水性粉末の分散に関する研究
プラズマイオン注入成膜法を用いたDLC膜に関する研究
所属学会
  • 電気化学会
  • The Electrochemical Society
最近の研究業績 Complex permeability spectra of polycrystalline Y. Oka, A. Uedono, K. Goto, Y. Hirose, M. Matsuura, M. Fujisawa, and K. Asai: “Structure-Modification Model of Porogen-Based Porous SiOC Film Ultraviolet Curing”, Jpn. J. Appl. Phys. 50 (2011) 05EB06.
J. Izumitani, D. Kodama, S. Kido, H. Chibahara, Y. Oka, K. Goto, N. Suzumura, M. Fujisawa, and H. Miyatake: “Cu Dual-Damascene Interconnects with Direct-C MP Process on Porous Low-k Film”, Jpn. J. Appl. Phys. 49 (2010) 05FC02.
M.Yatsuzuka, Y. Oka, M. Nishijima, and K. Hiraga: “Microstructure of interface for high-adhesion DLC film on metal substrates by plasma-based ion implantation”, Vacuum, 83 (2009) pp.190-197.
M.Yatsuzuka, Y. Oka, Y. Muramatsu, J. D. Denlinger, and E. M. Gullikson: “Local Structure Analysis of Carbon-Implanted Silicon Prepared with Plasma-Based Ion Implantation”, Frontier of Applied Plasma Technology, Vol. 2 (2009) pp.43-46.
Y. Oka, M. Nishijima, K. Hiraga, and M. Yatsuzuka: “A 400 um Thickness Diamond-like Carbon Film Preparation”, Diamond and Related Materials, 17 (2008) pp. 405-408.
M. Yatsuzuka and Y. Oka: “High-adhesion Diamond-like Carbon Film Coating on Stainless-steel Substrate by Plasma-based Ion Implantation and Deposition”, Frontier of Applied Plasma Technology, Vol. 1 (2008) pp.57-62.
M. Yatsuzuka, A. Tomita, Y. Oka, N. Murata, and M. Hirota: “Wear Properties of DLC and Plasma Sprayed WC Structure Coating”, Solid State Phenomena, Vol. 127 (2007) pp. 245-250.
T. Utsumi, Y. Oka, E. Fujiwara, and M. Yatsuzuka: “Effect of a hard supra-thick interlayer on adhesion of DLC film prepared with PBIID process”, Nuclear Instruments and Methods in Physical Research B, 257 (2007) pp.706-709.
Y. Oka, M. Nishijima, K. Hiraga, and M. Yatsuzuka: “Effect of Ion Implantation Layer on Adhesion of DLC Film by Plasma-Based Ion Implantation and Deposition”, Surface and Coating Technology, Vol.201, Issue 15 (2007) pp. 6647-6650.
Y. Yokoyama, S. Fukumoto, Y. Oka, M. Yatsuzuka, H. Tsubakino, and A. Inoue: “Improved Wear Resistance through Surface Modification of Zr50Cu30Ni10Al10 Bulk Glassy Alloys”, Materials Transactions, Vol. 47, No.8 (2006) pp.1999-2005.
M. Kirinuki, Y. Oka, and M. Yatsuzuka: “Control of Residual Stress and Deposition Rate of DLC Film by Plasma-based Ion Implantation”, Journal of Applied Plasma Science, Vol. 14 (2006) pp.121-128 [in Japanese].
Y. Oka, M. Kirinuki, T. Suzuki, M. Yatsuzuka, and K. Yatsui: “Effect of Ion Beam Implantation on Density of DLC Prepared by Plasma-based Ion Implantation”, Nuclear Instruments and Methods in Physical Research B, 242 (2006) pp.334-337.
Y. Oka and M. Yatsuzuka: “Measurement of Adhesion Strength of DLC Film Prepared by Utilizing Plasma-based Ion Implantation”, IEEJ Trans. FM, Vol.123, No.8 (2006) pp.801-806 [in Japanese].
Y. Oka, M. Nishijima, K. Hiraga, and M. Yatsuzuka: “Effect of Ion Implantation on DLC Preparation Using PBIID Process”, IEEE Trans. on Plasma Science, Special issue, Vol.34, No.4 (2006) pp.1183-1198.
E. Fujiwara, M. Kirinuki, K. Nishikawa, M. Onoi, Y. Oka, K. Azuma, and M. Yatsuzuka: “Optical Emission Measurements in Diamond like Carbon Deposition by Plasma Base Ion Implantation and Deposition (PBIID) System”, Smart Processing Technology, Vol. 1 (2006) pp.65-68.
A. Tomita, M. Kusuda, S. Otsuki, Y. Oka, Y. Nishimura, A. Murakami, and M. Yatsuzuka: “Enhancement of Adhesive Strength of DLC Film Prepared by PBIID on Co-Cr Alloy for Biomaterial”, Thin Solid Films, Vol.506/507 (2006) pp.59-62.
M. Kirinuki, M. Onoi, Y. Oka, K. Azuma, E. Fujiwara, and M. Yatsuzuka: “Negative Pulsed Voltage Discharge and DLC Preparation in PBIID System”, Thin Solid Films, Vol.506/507 (2006) pp.68-72.
L. Liu, A. Yamamoto, Y. Oka, M. Yatsuzuka, and H. Tsubakino: “Characteristics of diamond-like carbon film coated on pure aluminum”, Diamond and Related Materials, Vol. 14, (2005) pp.1047-1050.
L. Liu, A. Yamamoto, Y. Oka, M. Yatsuzuka, and H. Tsubakino: “Microstructural Observation of Diamond like Carbon Film Prepared from C2H2/C6H5CH3 Plasma Beam Source”, Materials Science Forum, Vols. 475-479, (2005) pp.2905-2908.
M. Kirinuki, A. Tomita, M. Kusuda, Y. Oka, A. Murakami and M. Yatsuzuka: “Enhancement of Adhesive Strength of DLC Film by Plasma-based Ion Implantation”, Materials Science Forum, Vol. 502 (2005) pp.315-320.
Y. Oka, Y. Nishimura, K. Azuma, E. Fujiwara, and M. Yatsuzuka: “Hardness Measurement of DLC Film Prepared by Plasma-based Ion Implantation and Deposition”, Trans. of Material Research Society of Japan, 29[2] (2004) pp.631-634.
Y. Oka, M. Kirinuki, Y. Nishimura, K. Azuma, E. Fujiwara, and M. Yatsuzuka: “Measurement of Residual Stress in DLC Films Prepared by Plasma-Based Ion Implantation and Deposition”, Surface and Coatings Technology, 186 (2004) pp.141-145.
Y. Oka, Y. Nishimura and M. Yatsuzuka: “DLC Coating of a Few um in Thickness on Three Dimensional Targets”, Vacuum, 73 (2004) pp.541-547.
M. Onoi, E. Fijiwara, Y. Oka, Y. Nishimura, K. Azuma, and M. Yatsuzuka: “Optical Measurement of Pulsed Plasma Produced by Combined RF and H.V. Pulses”, Surface and Coatings Technology, 186 (2004) pp.200-203.
Y. Oka, M. Tao, Y. Nishimura, K. Azuma, and M. Yatsuzuka: “Properties of Thick DLC Films Prepared by Plasma-based Ion Implantation and Deposition Using Combined RF and HV Pulses”, Nuclear Instruments and Methods in Physics Research B, 206 (2003) pp.700-703.
Y. Nishimura, Y. Oka, K. Azuma, E. Fujiwara, and M. Yatsuzuka: “Preparation of Ultra-Thick DLC Film Using Pulsed Plasma-Based Ion Implantation and Deposition”, High Temperature Society Japan. Vol.29, No.5 (2003) pp.196-200 [in Japanese].
Y. Nishimura, R. Ohkawa, Y. Oka, K. Azuma E. Fujiwara, and M. Yatsuzuka: “Preparation of Thick DLC Coating on a Trench Surface”, Trans. on Material Research Society of Japan, 28[2] (2003) pp.449-452.
Y. Nishimura, K. Tsukamoto, Y. Oka, K. Azuma, E. Fujiwara, and M. Yatsuzuka: “DLC Coating and Preparation on a Zn-alloy of Low Melting Point by the Hybrid Process of Plasma-based Ion Implantation and Deposition”, IEEJ Trans. FM, Vol.123, No.8 (2003) pp.744-749 [in Japanese].
Y. Nishimura, Y. Oka, H. Akamatusu, K. Azuma, and M. Yatsuzuka: “Uniform Coating of Thick DLC Film on Three-Dimensional Substrates”, Nuclear Instruments and Methods in Physics Research B, 206 (2003) 696-699.